WET工艺介绍(PPT 63页)
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- 工艺介绍
WET工艺介绍(PPT 63页)内容简介
For Etching process
Oxide remove.
Nitride remove.
Photoresist & polymer remove.
For Cleaning process
Free of particles.
Free of metal ion.
Free of organic.
Free of micro-roughness.
Free of native oxide.
..............................
Oxide remove.
Nitride remove.
Photoresist & polymer remove.
For Cleaning process
Free of particles.
Free of metal ion.
Free of organic.
Free of micro-roughness.
Free of native oxide.
..............................
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